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| Neuthane 3100DV - MDI - PTMEG Ether Rotational Casting System |
Neuthane 3100DV - MDI - PTMEG Ether Rotational Casting System
Properties
The Neuthane 3100DV series are high performance MDI – PTMEG ether rotational casting systems designed to produce roller coverings for use in arduous application areas.
They offer:
- a high level of physical properties
- very good dynamic performance
- good hydrolysis resistance
- non MOCA curatives
- processing without moulds
- room temperature curing
Typical Applications
- Steel mill rollers
- paper mill rollers
Processing can be by hand or by dispensing machine
Hand Processing
- Melt prepolymer at 50-70°C for 12-24 hours
- Heat the prepolymer and curative to the recommended temperature
- Ensure that the curative is thoroughly mixed prior to use (the storage tank on the machine should be fitted with agitation to prevent separation during use)
- Degass to remove air
- Adjust rotation and traverse speed until a smooth build up is achieved
- Cure as recommended
Processing Considerations
- Avoid prolonged storage of prepolymers at elevated temperatures. This will result in low hardness and lower properties of the cured material
- Avoid moisture contamination of all materials
- Part used containers should be flushed with dry nitrogen and resealed
immediately after use - To prevent de-lamination, subsequent layers should be applied within 30 minutes
Alternatives
- Solvents/Abrasion/Cut resistance - Ester based systems should be considered: Neuthane 3200 [MDI rotational casting]
- Cost – Ester systems will offer cost savings: Neuthane 3200 [MDI rotational casting] PPG ether systems will also offer advantages [Neuthane 3300*]
* Non-standard products - details are available upon request
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| Neuthane 3100DV - MDI - PTMEG Ether Rotational Casting System |
Information contained in the data is, to the best of our knowledge, true and accurate. Since conditions of use are beyond our control, no warranty is given or implied in respect of any recommendations or suggestions made by ourselves, nor is freedom from patent infringement inferred